Coating Equipment and Coating Method
At
present, thin film process technology is widely used in the semiconductor
industry and precision machinery. Due to the high added value of products
produced by thin film process technology, thin film process technology and thin
film materials are widely used in research and practice, and at the same time
bring coating Rapid development. Generally, coating methods mainly include ion
plating, radio frequency magnetron sputtering, vacuum evaporation, chemical
vapor deposition, and the like. However, with the increasing density and
miniaturization of integrated circuits, the precision of precision machinery
has increased, and the requirements for coating thickness have become
increasingly severe.
A
multifunctional magnetron sputtering coating system is provided. This system is
integrated with a vacuum coating system and a glove box system. It can complete
thin film evaporation in a high vacuum evaporation chamber and under a high
purity inert gas atmosphere in the glove box.
Storage,
preparation and testing of samples after evaporation
The
combination of evaporation coating and glove box realizes the fully enclosed
production of evaporation, packaging, and testing processes, so that the entire
film growth and device preparation process is highly integrated in a complete
controllable environment atmosphere system, eliminating the organic large area
circuit preparation process The influence of unstable factors in the
atmospheric environment guarantees the preparation of high-performance,
large-area organic optoelectronic devices and circuits.
Main
application: used to prepare various metal films, semiconductor films,
dielectric films, magnetron films, optical films, superconducting films,
sensing films, and functional films with special needs.
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