Coating Equipment and Coating Method


At present, thin film process technology is widely used in the semiconductor industry and precision machinery. Due to the high added value of products produced by thin film process technology, thin film process technology and thin film materials are widely used in research and practice, and at the same time bring coating Rapid development. Generally, coating methods mainly include ion plating, radio frequency magnetron sputtering, vacuum evaporation, chemical vapor deposition, and the like. However, with the increasing density and miniaturization of integrated circuits, the precision of precision machinery has increased, and the requirements for coating thickness have become increasingly severe.

A multifunctional magnetron sputtering coating system is provided. This system is integrated with a vacuum coating system and a glove box system. It can complete thin film evaporation in a high vacuum evaporation chamber and under a high purity inert gas atmosphere in the glove box.
Storage, preparation and testing of samples after evaporation
The combination of evaporation coating and glove box realizes the fully enclosed production of evaporation, packaging, and testing processes, so that the entire film growth and device preparation process is highly integrated in a complete controllable environment atmosphere system, eliminating the organic large area circuit preparation process The influence of unstable factors in the atmospheric environment guarantees the preparation of high-performance, large-area organic optoelectronic devices and circuits.
Main application: used to prepare various metal films, semiconductor films, dielectric films, magnetron films, optical films, superconducting films, sensing films, and functional films with special needs.

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