Coating Device and Coating Method
In the vacuum
vapor deposition process, stable vapor deposition cannot be performed, and in
the worst case, some nozzles are blocked, and uniform coating cannot be
performed. For this reason, after a certain period of time, the vacuum is
broken, the nozzle and its surroundings are cleaned, and the vacuum is operated
again. Cleaning in vacuum chambers has not been considered before. Once the
vacuum of the vacuum chamber is broken, it takes time to obtain the
predetermined degree of vacuum.
Therefore, a
glove box vapor deposition all-in-one machine is provided. This system is a
combination of a vacuum coating system and a vacuum glove box system, which can
complete film evaporation in a high vacuum evaporation chamber and a high
purity inert gas atmosphere. The samples are stored, prepared, and tested after
evaporation.
The
combination of evaporation coating and vacuum glove box realizes the fully
enclosed production of evaporation, packaging, testing and other processes, so
that the entire thin film growth and device preparation process is highly
integrated in a complete controllable environment atmosphere system,
eliminating the organic large area circuit preparation process The influence of
unstable factors in the atmospheric environment ensures the production of
high-performance, large-area organic optoelectronic devices and circuits.
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